A New Fitting Function Characterizing Target Erosion Profile in Magnetron Sputtering
نویسندگان
چکیده
منابع مشابه
CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study
CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...
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ژورنال
عنوان ژورنال: SHINKU
سال: 2004
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.47.386